Sol–gel-deposited ZnO thin films: A review

During the last years, ZnO thin films have been studied extensively due to their potential applications in e.g. piezoelectric and optoelectronic devices or photovoltaic cells. Ordered c-axis orientation of ZnO crystallites is desirable for applications where crystallographic anisotropy is a prerequisite such as for short-wavelength semiconductor diode lasers (SDLs), and piezoelectric surface acoustic wave or acousto-optic devices. Many works were dedicated to c-axis oriented ZnO thin films elaboration and the study of their properties, including physical and chemical methods. For instance, sol–gel processes are particularly well adapted to produce ZnO films in a simple, low-cost and highly controlled way. This review summarizes the main chemical routes used in the sol–gel synthesis of undoped ZnO thin films and highlights the chemical and physical parameters influencing their structural properties. In this process, the ZnO films synthesis includes three principal steps: (i) solution preparation, (ii) coating and (iii) heat treatment. For the first step, the particle formation is discussed including nucleation and growth, particle size, morphology and colloids stability. These three steps involve several parameters such as: (i) nature and concentration of precursor, solvent and additive, and solution aging time, for the chemical system, (ii) coating method, thickness and substrate for the coating step, and (iii) pre-and post-heat treatment for the last step. The influence of these steps and synthesis parameters on ZnO thin films orientation is discussed.