Title of article :
n-Type CVD diamond: Epitaxy and doping
Author/Authors :
Marie-Amandine Pinault-Thaury، نويسنده , , M.-A. and Tillocher، نويسنده , , T. and Habka، نويسنده , , N. and Kobor، نويسنده , , D. and Jomard، نويسنده , , F. and Chevallier، نويسنده , , J. and Barjon، نويسنده , , J.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
8
From page :
1401
To page :
1408
Abstract :
Diamond is a semiconductor with superlative properties in terms of operating temperature, breakdown voltage and thermal dissipation for high power electronic applications. The p-type doping is currently controlled but it is not the case for the n-type doping. In spite of the low solubility of substitutional donors bigger than carbon, n-type material can be achieved via impurity doping during the growth of diamond with phosphorus dopant (Ec = 0.6 eV). Theoretical studies also predict arsenic as a shallower dopant (Ec = 0.4 eV). This paper outlines the n-type doping issues with phosphorus and explores the arsenic doping.
Keywords :
n-Type diamond , CVD , Arsenic , Phosphorus , Incorporation model
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Serial Year :
2011
Journal title :
MATERIALS SCIENCE & ENGINEERING: B
Record number :
2148764
Link To Document :
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