• Title of article

    Tensile strength of electrodeposited nanocrystalline Ni–W alloys with finely dispersed micrometer-sized array through-holes

  • Author/Authors

    Yamasaki، نويسنده , , Tohru and Oda، نويسنده , , Natsuko and Matsuoka، نويسنده , , Hiroyuki and Fukami، نويسنده , , Takeshi، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2007
  • Pages
    3
  • From page
    833
  • To page
    835
  • Abstract
    Electrodeposited nanocrystalline Ni–W alloys with finely dispersed micrometer-sized array through-holes having diameters between 20 μm and 50 μm with a regular interval of 100 μm have been prepared by using UV (ultraviolet light)-lithographic techniques. In the case of monolithic nanocrystalline Ni–16 at.% W alloys with a grain diameter of 10–20 nm, the nominal tensile strength and the total elongation at fracture were attained at 1700 MPa and about 1%, respectively. With finely dispersed array through-holes having a diameter of 30 μm, the tensile strength and the total elongation at fracture increased up to about 2200 MPa and 1.2%, respectively. This may be due to the multiplication of highly localized yielding beginning at the finely dispersed array through-holes that can moderate the propagation of individual shear bands and cracks effectively.
  • Keywords
    Ni–W , Nanocrystalline materials , Finely dispersed micrometer sized array through-holes , UV-lithographic techniques , Electrodeposition , Shear bands deformation
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Serial Year
    2007
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Record number

    2151500