Title of article
Nanometer-Scale Patterning on PMMA Resist by Force Microscopy Lithography
Author/Authors
-، - نويسنده Catalysis Research Center, Research Institute of Petroleum Industry (RIPI), P.O. Box 18754-4163 Tehran, I.R. IRAN Sadegh Hassani, Sedigheh , -، - نويسنده Catalysis Research Center, Research Institute of Petroleum Industry (RIPI), P.O. Box 18754-4163 Tehran, I.R. IRAN Sobat, Zahra , -، - نويسنده Catalysis Research Center, Research Institute of Petroleum Industry (RIPI), P.O. Box 18754-4163 Tehran, I.R. IRAN Aghabozorg, Hamid Reza
Issue Information
فصلنامه با شماره پیاپی 0 سال 2008
Pages
6
From page
29
To page
34
Abstract
-
Abstract
Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the depth of scratches increases with the increase of applied normal force. The scanning velocity is also shown to influence the AFM patterning process. As the scanning velocity increases, the scratch depth decreases. The influence of time and number of scratching cycles is also investigated.
Journal title
Iranian Journal of Chemistry and Chemical Engineering (IJCCE)
Serial Year
2008
Journal title
Iranian Journal of Chemistry and Chemical Engineering (IJCCE)
Record number
2151919
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