Title of article
Recent progress in low-energy electron diffraction: theory and application to semiconductor surfaces
Author/Authors
Sakama، نويسنده , , Hiroshi and Kawazu، نويسنده , , Akira، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1995
Pages
63
From page
255
To page
317
Abstract
The atomic arrangements of semiconductor surfaces, which are important for an understanding of surface properties, are determined by the dynamic low-energy electron diffraction (LEED) method. Real-time control of epitaxial growth is possible via the measurement of intensity variations of LEED spots. The size and distance distribution of islands are clarified by spot profile analysis of LEED (SPA-LEED). Direct imaging of surface processes such as phase transition and epitaxial growth is possible using low-energy electron microscopy (LEEM).
Keywords
Low-energy electron diffraction , phase transition , Semiconductors , epitaxial growth
Journal title
Materials Science and Engineering R Reports
Serial Year
1995
Journal title
Materials Science and Engineering R Reports
Record number
2152289
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