Title of article :
SiGe field effect transistors
Author/Authors :
Xie، نويسنده , , Y.H.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
33
From page :
89
To page :
121
Abstract :
Starting from a brief review of the basics of FETs and BJTs, we discuss typical applications of the two types of transistors, which is followed by a FET performance analysis including the transconductance, speed, power consumption, and packing density. These sections form the foundations for the understanding of the pros and cons of strained SiGe FETs. Based on this foundation, we scrutinize the perceived advantages of using SiGe, review the array of SiGe FET structures, and look at material and processing challenges.
Journal title :
Materials Science and Engineering R Reports
Serial Year :
1999
Journal title :
Materials Science and Engineering R Reports
Record number :
2152381
Link To Document :
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