Title of article :
Conduction bandstructure in strained silicon by spatially resolved electron energy loss spectroscopy
Author/Authors :
Batson، نويسنده , , P.E.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 1995
Pages :
8
From page :
63
To page :
70
Abstract :
Silicon 2p core absorption near edge fine structure has been obtained by spatially resolved electron energy loss spectroscopy in strained silicon quantum wells. Extraction of the heterojunction band offset as a function of position in the wells appears to be possible with some caution. The band offset has been correlated with atomic composition using annular dark field, Z-contrast imaging. The results suggest that the poor electron mobility, found in one of the wells by standard electrical measurements, resulted from poor carrier screening in the presence of a heterojunction band offset which varied by as much as 50 meV from place to place within the well.
Journal title :
Ultramicroscopy
Serial Year :
1995
Journal title :
Ultramicroscopy
Record number :
2154398
Link To Document :
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