Author/Authors :
Larson، نويسنده , , D.J. and Miller، نويسنده , , M.K. and Ulfig، نويسنده , , R.M and Matyi، نويسنده , , R.J and Camus، نويسنده , , P.P and Kelly، نويسنده , , T.F، نويسنده ,
Abstract :
The feasibility of fabricating field ion specimens from planar surfaces by the technique of ion beam mask etching has been demonstrated. The production of an electric field at the tip apex sufficient to produce field evaporation has been accomplished by a combination of the minimization of the surface area, the increase in the tip height above the planar surface, and the minimization of the tip radius and shank angle.
