Title of article
Studies of field emission current from amorphous silicon deposited on a tungsten tip
Author/Authors
Sharma، نويسنده , , R.B and Pradeep، نويسنده , , N and Joag، نويسنده , , D.S. and Pal، نويسنده , , Surendra N. Dubey، نويسنده , , G.C، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 1999
Pages
4
From page
131
To page
134
Abstract
Field electron emission from an amorphous silicon deposited tungsten tip has been studied. The current–voltage (I–V) characteristics corresponding to the as-deposited and annealed states of the emitter were recorded. These characteristics showed semiconducting behaviour. Field emission current fluctuations from the two states were recorded. As-deposited tip shows more spikes in low-field region and a mixture of spikes and steps at higher fields. Fast Fourier Transform analysis of the current signal shows Lorentzian-type of power spectrum which is indicative of bistable traps in a-Si : H. Total emission current level remained almost constant for the entire duration of recording.
Journal title
Ultramicroscopy
Serial Year
1999
Journal title
Ultramicroscopy
Record number
2155241
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