Title of article :
Plasma active sintering of silicon carbide
Author/Authors :
Jin، نويسنده , , Hai-Yun and Ishiyama، نويسنده , , Masaaki and Qiao، نويسنده , , Guan-Jun and Gao، نويسنده , , Ji-Qiang and Jin، نويسنده , , Zhi-Hao، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
4
From page :
270
To page :
273
Abstract :
Silicon carbide (SiC) ceramics were fabricated by plasma-activated sintering. The sintering was accomplished at relatively low temperatures within a short time. The grain growth of the SiC ceramics was considerably inhibited, and finally SiC ceramics with a higher bending strength (853.7 MPa) and fracture toughness (8.34 MPa m1/2) could be fabricated.
Keywords :
Plasma-activated sintering , microstructure , SiC
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Serial Year :
2008
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Record number :
2155322
Link To Document :
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