• Title of article

    Observation of removal of an Fmoc protecting group by scanning tunneling microscopy

  • Author/Authors

    Kudo، نويسنده , , H and Okamoto، نويسنده , , Y and Kwak، نويسنده , , K.J and Fujihira، نويسنده , , M، نويسنده ,

  • Issue Information
    دوماهنامه با شماره پیاپی سال 2004
  • Pages
    6
  • From page
    353
  • To page
    358
  • Abstract
    We demonstrate here by imaging successive surface reactions in self-assembled monolayers (SAMs) on Au(1 1 1) at molecular scale with a scanning tunneling microscope (STM): (i) SAM matrices formation with 1-octanethiol on Au(1 1 1) in ethanol, (ii) insertion of N-Fmoc-aminooctanethiol into the SAM matrices in ethanol, and (iii) removal of the Fmoc protecting group with tris(2-aminoethyl)amine (TAEA). The total reaction is formation of SAMs containing a small amount of NH2 terminated molecules in the CH3 terminated SAM matrices. After the reaction of the protecting group with TAEA, STM imaging revealed the decrease in heights of the inserted molecules on average. We attributed this observation to removal of the protecting group by taking account of a convolution of electronic and topographic contributions to observed STM heights. Apparent areas of the terminal groups, however, became larger on removal. The increase in the areas was attributed to water adsorption to the NH2 terminal group under air.
  • Keywords
    Removal of an Fmoc protecting group , Self-assembled monolayers , Scanning tunneling microscopy
  • Journal title
    Ultramicroscopy
  • Serial Year
    2004
  • Journal title
    Ultramicroscopy
  • Record number

    2156210