• Title of article

    Nanotribological properties of precision-controlled regular nanotexture on H-passivated Si surface by current-induced local anodic oxidation

  • Author/Authors

    Mo، نويسنده , , Yufei and Zhao، نويسنده , , Wenjie and Huang، نويسنده , , Deming and Zhao، نويسنده , , Yang-Fei and Bai، نويسنده , , Mingwu، نويسنده ,

  • Issue Information
    دوماهنامه با شماره پیاپی سال 2009
  • Pages
    6
  • From page
    247
  • To page
    252
  • Abstract
    Nano-sized textures resulted from localized electrochemical oxidation by using atomic force microscopy (AFM) were fabricated on H-passivated Si surface. In this paper, the fabrication and nanotribological properties of nanotexture by local anodic oxidation (LAO) on H-passivated Si surface are presented. A special attention is paid to find the relation between the size of oxide nanotexture and operational parameters such as tip-sample pulsed bias voltage, pulsewidth, and relative humidity to fabricate oxide nanotexture. The nanotribological properties were investigated by a colloidal probe. The results indicate that the nanotextures exhibited low adhesion and greatly reduced friction force at nanometer scale.
  • Keywords
    Nanotexture , Local anodic oxidation , atomic force microscopy , Nanotribology
  • Journal title
    Ultramicroscopy
  • Serial Year
    2009
  • Journal title
    Ultramicroscopy
  • Record number

    2157495