Title of article :
Strain measurement at the nanoscale: Comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark field electron holography
Author/Authors :
Béché، نويسنده , , A. and Rouvière، نويسنده , , J.L. and Barnes، نويسنده , , J.P. and Cooper، نويسنده , , D.، نويسنده ,
Issue Information :
دوماهنامه با شماره پیاپی سال 2013
Abstract :
Convergent beam electron diffraction (CBED), nano-beam electron diffraction (NBED or NBD), high resolution imaging (HRTEM and HRSTEM) and dark field electron holography (DFEH or HoloDark) are five TEM based techniques able to quantitatively measure strain at the nanometer scale. In order to demonstrate the advantages and disadvantages of each technique, two samples composed of epitaxial silicon–germanium layers embedded in a silicon matrix have been investigated. The five techniques are then compared in terms of strain precision and accuracy, spatial resolution, field of view, mapping abilities and ease of performance and analysis.
Keywords :
High resolution transmission electron microscopy (HRTEM) , Transmission electron microscopy , strain , Dark field electron holography (DFEH) , Nano-beam electron diffraction (NBED or NBD) , Convergent beam electron diffraction (CBED) , High resolution scanning transm
Journal title :
Ultramicroscopy
Journal title :
Ultramicroscopy