Title of article
Strain measurement at the nanoscale: Comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark field electron holography
Author/Authors
Béché، نويسنده , , A. and Rouvière، نويسنده , , J.L. and Barnes، نويسنده , , J.P. and Cooper، نويسنده , , D.، نويسنده ,
Issue Information
دوماهنامه با شماره پیاپی سال 2013
Pages
14
From page
10
To page
23
Abstract
Convergent beam electron diffraction (CBED), nano-beam electron diffraction (NBED or NBD), high resolution imaging (HRTEM and HRSTEM) and dark field electron holography (DFEH or HoloDark) are five TEM based techniques able to quantitatively measure strain at the nanometer scale. In order to demonstrate the advantages and disadvantages of each technique, two samples composed of epitaxial silicon–germanium layers embedded in a silicon matrix have been investigated. The five techniques are then compared in terms of strain precision and accuracy, spatial resolution, field of view, mapping abilities and ease of performance and analysis.
Keywords
High resolution transmission electron microscopy (HRTEM) , Transmission electron microscopy , strain , Dark field electron holography (DFEH) , Nano-beam electron diffraction (NBED or NBD) , Convergent beam electron diffraction (CBED) , High resolution scanning transm
Journal title
Ultramicroscopy
Serial Year
2013
Journal title
Ultramicroscopy
Record number
2158982
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