Title of article :
Microstructure and tensile deformation of nanocrystalline Cu produced by pulse electrodeposition
Author/Authors :
Zhang، نويسنده , , Hanzhuo and Jiang، نويسنده , , Zhonghao and Qiang، نويسنده , , Yinghuai، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Pages :
5
From page :
316
To page :
320
Abstract :
Bulk nanocrystalline Cu with an average grain size of 33 nm, a strong {2 0 0} texture and a narrow grain size distribution was produced by pulse electrodeposition. Tensile tests on this material indicated a combination of high yield strength (624 MPa), limited tensile elongation (<5%) and enhanced strain rate sensitivity (0.029). Deformation mechanisms were discussed with strain rate sensitivity and activation volume under analytical models from the literature. Overall, the plastic deformation of the nanocrystalline Cu was dominated by dislocation processes, while grain boundary activities were also involved especially at the lowest strain rate. Analysis on the fracture surfaces revealed a brittle feature.
Keywords :
microstructure , mechanical properties , Strain rate , Plastic deformation , Nanocrystalline
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Serial Year :
2009
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Record number :
2160841
Link To Document :
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