Title of article
At the limit of polychromatic microdiffraction
Author/Authors
Ice، نويسنده , , Gene E. and Pang، نويسنده , , Judy W.L. and Larson، نويسنده , , Bennett C. and Budai، نويسنده , , John D. and Tischler، نويسنده , , Jonathan Z. and Choi، نويسنده , , Jae-Young and Liu، نويسنده , , Wenjun and Liu، نويسنده , , Chian and Assoufid، نويسنده , , Lahsen and Shu، نويسنده , , Deming and Khounsary، نويسنده , , Ali، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
7
From page
3
To page
9
Abstract
With a high-energy 3rd generation source like the Advanced Photon Source (APS), it is possible to push the performance of polychromatic microdiffraction far beyond current levels and to approach the intrinsic limit of the technique based on sample damage and the diffraction limit of X-rays. We describe ongoing efforts to improve the spatial, temporal and momentum transfer resolution of polychromatic microdiffraction on beamline 34-ID-E at the APS. The goal of this effort is to provide high-resolution images of 3D crystal structures over sufficient volumes and with sufficient detail to clarify the underlying physics of inhomogeneous structure and evolution on mesoscopic length scales. The performance of a high-speed amorphous Si area detector system and the ongoing development of advanced focusing optics will be described and discussed in light of the ultimate limits set by the physics of X-rays and materials, and in light of opportunities to field specialized insertion devices and optics for polychromatic microdiffraction.
Keywords
structure , X-Ray , Laue diffraction , microbeam , mesoscale
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Serial Year
2009
Journal title
MATERIALS SCIENCE & ENGINEERING: A
Record number
2161211
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