Title of article :
Nucleation, coarsening, and coalescence during layer-by-layer growth of complex oxides via pulsed laser deposition: Time-resolved, diffuse X-ray scattering studies
Author/Authors :
Brock، نويسنده , , J.D. and Ferguson، نويسنده , , J.D. and Kim، نويسنده , , Yongsam and Wang، نويسنده , , Hui-Qiong and Woll، نويسنده , , A.R.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
5
From page :
72
To page :
76
Abstract :
We review our real-time X-ray diffuse scattering studies of the evolving structure of complex oxide thin films during pulsed laser deposition in the layer-by-layer growth mode. These measurements provide detailed structural information on the time- and length-scales relevant for growth kinetics. Specifically, we measure both the in-plane length scale, L, and the characteristic relaxation time, τ, as a function of temperature to obtain the diffusivity, D. For both homo- and hetero-epitaxy, island nucleation under supersaturated conditions followed by coarsening of the island distribution, first via ripening and subsequently by coalescence, are identified as the key fundamental growth processes.
Keywords :
Coarsening , Nucleation , Interfaces , Synchrotron X-ray diffraction
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Serial Year :
2010
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Record number :
2166797
Link To Document :
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