• Title of article

    Nucleation, coarsening, and coalescence during layer-by-layer growth of complex oxides via pulsed laser deposition: Time-resolved, diffuse X-ray scattering studies

  • Author/Authors

    Brock، نويسنده , , J.D. and Ferguson، نويسنده , , J.D. and Kim، نويسنده , , Yongsam and Wang، نويسنده , , Hui-Qiong and Woll، نويسنده , , A.R.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2010
  • Pages
    5
  • From page
    72
  • To page
    76
  • Abstract
    We review our real-time X-ray diffuse scattering studies of the evolving structure of complex oxide thin films during pulsed laser deposition in the layer-by-layer growth mode. These measurements provide detailed structural information on the time- and length-scales relevant for growth kinetics. Specifically, we measure both the in-plane length scale, L, and the characteristic relaxation time, τ, as a function of temperature to obtain the diffusivity, D. For both homo- and hetero-epitaxy, island nucleation under supersaturated conditions followed by coarsening of the island distribution, first via ripening and subsequently by coalescence, are identified as the key fundamental growth processes.
  • Keywords
    Coarsening , Nucleation , Interfaces , Synchrotron X-ray diffraction
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Serial Year
    2010
  • Journal title
    MATERIALS SCIENCE & ENGINEERING: A
  • Record number

    2166797