Title of article :
Enhancing dislocation emission in nanocrystalline materials through shear-coupled migration of grain boundaries
Author/Authors :
Li، نويسنده , , Jianjun and Soh، نويسنده , , A.K. and Wu، نويسنده , , Xiaolei، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2014
Pages :
6
From page :
153
To page :
158
Abstract :
A theoretical model has been developed to illustrate the effect of shear-coupled migration of grain boundaries on dislocation emission in nanocrystalline materials. The energy characteristics and critical shear stress τ c that is required to initiate the emission process were determined. The results obtained show that the dislocation emission can be considerably enhanced as shear-coupled migration was the dominating process; a critical coupling factor that corresponded to the minimum τ c , which led to an optimal dislocation emission, was also discovered. The proposed model has also been quantitatively validated by the existing molecular dynamics simulations.
Keywords :
Shear-coupled migration of grain boundaries , Dislocations , Strength and ductility , Nanocrystalline materials
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Serial Year :
2014
Journal title :
MATERIALS SCIENCE & ENGINEERING: A
Record number :
2175509
Link To Document :
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