Title of article :
An application of a new type deposition method to nuclear target preparation
Author/Authors :
Sugai، نويسنده , , Isao، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
10
From page :
81
To page :
90
Abstract :
We have developed a new deposition method, which is based on the vibrational motion of microparticles in the electrostatic field between parallel electrodes. This method is straight forward and does not require any complicated mechanism. It has been found that this deposition technique is useful for the preparation of foils, in both the backed and unbacked condition. The first test results are reported.
Keywords :
osmium , Thickness by charged particle reactions , Tungsten , Uniformity of target , Substrate temperature , Chromium , Beryllium , Focussed sputtering , Efficiency of evaporation , Manganese , Molybdenum , nickel , PALLADIUM , Powder target , Purity of target , boron
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Serial Year :
1997
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Record number :
2176473
Link To Document :
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