Characteristics of ablation plasma produced by pulsed light ion beam interaction with targets and applications to materials science

Characteristics of the ablation plasma produced by intense, pulsed light ion beams have been studied together with its applications to prepare thin films. The plasma behavior was diagnosed by high-speed photography, while the dynamic pressure of the ablation plasma by the foil acceleration studies. As an example of the applications, we present the preparation of dielectric thin films by using the technique of ion beam evaporation.