Title of article :
Optics developments in the VUV—soft X-ray spectral region
Author/Authors :
Feigl، نويسنده , , T. and Heber، نويسنده , , Charles J. and Gatto، نويسنده , , A. and Kaiser، نويسنده , , N.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
6
From page :
351
To page :
356
Abstract :
The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the search for technological innovations and improvements. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. This paper covers some theoretical considerations, material aspects, design and different techniques of controlled fabrication of multilayer coated optics. Their potential applications for microlithography as well as alternative application fields like microscopy, spectroscopy, soft X-ray lasers and free electron lasers are also discussed.
Keywords :
VUV , EUV , Multilayer optics , microlithography , Soft X-ray
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Serial Year :
2002
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Record number :
2195609
Link To Document :
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