Title of article :
Molecular dynamics study of xenon on an amorphous Al2O3 surface
Author/Authors :
Blنckberg، نويسنده , , L. and Metsanurk، نويسنده , , E. and Tamm، نويسنده , , A. and Aabloo، نويسنده , , A. and Klintenberg، نويسنده , , M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2014
Pages :
6
From page :
10
To page :
15
Abstract :
Xenon self-diffusion on amorphous Al2O3 surfaces has been studied using molecular dynamics (MD) simulations. The results show that the topology of the amorphous alumina surface has a considerable effect on the mobility of Xe. Adding nanoscale scratches to the surface will both increase the adsorption energies and lower the surface diffusion coefficients. These findings give a possible explanation to the need for unexpectedly thick ALD deposited amorphous Al2O3 films used as gas diffusion barriers on polymeric systems.
Keywords :
Molecular dynamics , Xenon , Al2O3 , Gas diffusion , Plastic scintillator , Adsorption
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Serial Year :
2014
Journal title :
Nuclear Instruments and Methods in Physics Research Section A
Record number :
2196168
Link To Document :
بازگشت