Energy device for monitoring 4–10 MeV industrial electron accelerators

The electron beam energy is one of the critical parameters for electron processing, since it can affect the dose distribution in the product. We have developed a robust device for monitoring small variations in the electron beam energy that is easy-to-use during an irradiation run. It involves measurement of currents intercepted by two aluminium plates located in the beam. The ratio of these two currents is quite sensitive to the beam energy; sensitivity is optimised by selecting the appropriate thickness of the front plate depending on the beam energy. We had reported on this energy device earlier for the energy range of 7–12 MeV. In the present paper, we have investigated the feasibility of using this energy device at lower energies, from 4 to 6 MeV.