Author/Authors :
Hirai، نويسنده , , Yasuharu and Yasuami، نويسنده , , Shigeru and Kobayashi، نويسنده , , Akira and Hirai، نويسنده , , You and Nishino، نويسنده , , Jun’ichi and Shibata، نويسنده , , Masahiro and Yamaguchi، نويسنده , , Koji and Liu، نويسنده , , Kuang-Yu and Kawado، نويسنده , , Seiji and Yamamoto، نويسنده , , Tohru and Noguchi، نويسنده , , Shin’ichi and Takahashi، نويسنده , , Mamoru and Konomi، نويسنده , , Shin-ichiro and Kimura، نويسنده , , Shigeru and Hasegawa، نويسنده , , Masaki and Awaji، نويسنده , , Naoki and Komiya، نويسنده , , Satoshi and Hirose، نويسنده , , Takayuki and Ozaki، نويسنده , , Shinji and Okajima، نويسنده , , Toshihiro and Ishikawa، نويسنده , , Tetsuya and Kitamura، نويسنده , , Hideo، نويسنده ,
Abstract :
A new X-ray undulator beamline has been designed and constructed by an industrial consortium of 13 companies at SPring-8. The beamline, named BL16XU, is intended for the characterization of various materials developed for industrial purposes and, together with its sister bending-magnet beamline (BL16B2), has been open to user experiments since the autumn of 1999. The new beamline provides high-brilliance synchrotron radiation in the energy range from 4.5 to 40 keV from an X-ray undulator of the in-vacuo type. The beamline has an experimental hutch for the performance of several experiments: e.g. microscopic observation of materials and micro-fabricated devices by using X-ray beams that have spot sizes of 1 μm or less; X-ray diffraction experiments on thin films with nanometer-scale thickness by using an ω−2θ diffractometer; fluorescence X-ray analysis of trace elements on Si wafer surfaces by using a total reflection fluorescence X-ray analysis system equipped with wavelength- and energy-dispersive detectors.
Keywords :
Synchrotron radiation , X-ray undulator , Double-crystal monochromator , Scanning X-ray microscope , X-ray diffractometer , Fluorescence X-ray analysis system
