Author/Authors :
Chkhalo، نويسنده , , N.I. and Kluenkov، نويسنده , , E.B. and Pestov، نويسنده , , A.E. and Polkovnikov، نويسنده , , V.N. and Raskin، نويسنده , , D.G. and Salashchenko، نويسنده , , N.N. and Suslov، نويسنده , , L.A. and Toropov، نويسنده , , M.N.، نويسنده ,
Abstract :
In this paper, first results of finishing EUV mirror substrate surface shape to given parameters using correction methods such as vacuum thin films deposition and local ion-beam etching through the mask are presented. For spherical mirror substrate with radius of curvature R=260 mm and a diameter of 130 mm, obtained values of PV=4.7 nm and RMS=0.6 nm.
Keywords :
EUV lithography , Roughness , Multilayer mirrors , Ion etching
