Title of article :
Photodegradation of bisphenol AF in montmorillonite dispersions: Kinetics and mechanism study
Author/Authors :
Liu، نويسنده , , Yanxiang and Zhang، نويسنده , , Xu and Wu، نويسنده , , Feng، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Pages :
5
From page :
182
To page :
186
Abstract :
The photodegradation behavior of bisphenol AF (BPAF) in montmorillonite KSF dispersions was investigated. The influence of KSF dosage, initial BPAF concentration and initial pH on the degradation of BPAF was studied. The main purposes were to clarify the degradation mechanism of BPAF and quantify the fluorine concentration during the degradation. At an initial concentration of 40 μM, more than 78% TOC was removed within 600 min irradiation, and the concentration of fluorine was 0.62 mg L− 1. Degradation of BPAF followed the Langmuir–Hinshelwood kinetics rate model and the reaction rate constant kre was 0.887 μM min− 1. Hydroxyl radicals were the main reactive species in the irradiated KSF dispersion. Intermediates of BPAF decomposition were determined by LC–MS analysis.
Keywords :
Fenton reaction , Montmorillonite , Photodegradation , Bisphenol
Journal title :
Applied Clay Science:an International Journal on the Application...
Serial Year :
2010
Journal title :
Applied Clay Science:an International Journal on the Application...
Record number :
2223058
Link To Document :
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