Title of article :
Study of ground and unground leached vermiculite II. Thermal behaviour of ground acid-treated vermiculite
Author/Authors :
Perez-Rodriguez، نويسنده , , J.L. and Maqueda، نويسنده , , C. and Murafa، نويسنده , , N. and ?ubrt، نويسنده , , J. and Balek، نويسنده , , V. and Puli?ov?، نويسنده , , P. and Lan?ok، نويسنده , , A.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
9
From page :
274
To page :
282
Abstract :
In this study, we examined the annealing effect on the material obtained after acid treatment of ground vermiculite which constituted amorphous silica and β-FeOOH. The XRD patterns of the starting sample measured at temperatures from 30 to 1200 °C showed that the crystalline phase was present until ~ 300 °C; whereas the sample heated between 300 and 800 °C was practically amorphous. This is in agreement with previous observations that β-FeOOH decomposes to amorphous or poorly crystalline phase, β-Fe2O3, and transforms only slowly to crystalline α-Fe2O3. At 850 °C the sample showed the first signs of a crystalline phase which was fully developed at 1050 °C. The XRD, HRTEM and Mössbauer spectroscopy showed, after heating at 1050 °C, the presence of crystalline phase, consisting of quartz, cristobalite, α-Fe2O3 and ε-Fe2O3. This effect showed in fact that well crystallized iron oxide nanoparticles embedded into the silica matrix are usually formed at relative high temperatures (~ 1000 °C), which is in contrast to silica-free material. Element mapping of one particle of the composite obtained by annealing the sample at the highest temperature showed well-separated Fe2O3 and SiO2 particles in a composite material. Impurities of Al and Mg (from the original vermiculite) accompanied the silica components and TiO2 associated with Fe2O3 grains was also detected.
Keywords :
Vermiculite , Annealing , amorphous silica , ?-FeOOH , ?-Fe2O3 , ?-Fe2O3
Journal title :
Applied Clay Science:an International Journal on the Application...
Serial Year :
2011
Journal title :
Applied Clay Science:an International Journal on the Application...
Record number :
2223225
Link To Document :
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