Optimum design of processing condition and experimental investigation of grating fabrication with hot embossing lithography

The cross-section profiles of polymer deformation in the hot embossing lithography process were studied by finite element method for various temperature, time and pressure. In order to successfully fabricate high-frequency grating lines, an optimal imprint condition was selected and the related experiments were carried out. The fabricated gratings were illuminated by the SEM image and AFM analysis, which agree well with the simulated results. Therefore, the finite element methods are helpful for a better comprehension of the polymer flow phenomena governing the pattern definition and the design of optimum processing conditions for successful grating fabrication.