Author/Authors :
Parchehbaf Jadid، Aiyoub نويسنده Department of Applied Chemistry, Ardabil Branch, Islamic Azad University, Ardabil, I.R. IRAN , , Pourjafar، Mostafa نويسنده Department of Chemistry, Payame Noor University, Tehran, Iran Pourjafar, Mostafa , Banaei، Alireza نويسنده Department of Chemistry, Payame Noor University, Tehran, Iran Banaei, Alireza
Abstract :
In this study, Taguchi method has been used for optimization of chromium(VI) electroplating process and for this purpose brass materials have been electroplated under different conditions of the process to study their effects on throwing power of chromium deposit. Finally the results of main effects plot and analysis of variance showed that among the influential factors in this process, only current density of 4 A/dm2 and time of 4 minutes have the most effects in the characteristics of the response. Also SEM images confirmed that the crack density on the surface of Cr-deposit is decreased under the mentioned conditions
