Title of article
AFM, SEM, EDX and HRTEM study of the crystalline growth rate anisotropy-induced internal stress and surface roughness of YBaCuO thin film
Author/Authors
Pailloux، نويسنده , , F and Gaboriaud، نويسنده , , R.J and Champeaux، نويسنده , , C and Catherinot، نويسنده , , A، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
9
From page
55
To page
63
Abstract
The influence of the anisotropy of the crystalline growth rate on the microstructure and morphology of YBaCuO thin film deposited by laser ablation has been studied by means of scanning electron microscopy (SEM) and transmission electron microscopy (TEM), atomic force microscopy (AFM) and energy dispersive X-ray (EDX) analysis. The results obtained from high resolution lattice imaging and large angle convergent beam electron diffraction (LACBED), together with the investigations of the thin film surface morphology, show the strong influence of the different crystalline growth rates on both the internal stress present in the YBaCuO film and the roughness of the outer surface. These results should be of prime importance for the superconducting properties. This is essential in tailoring these thin films for device applications.
Journal title
Materials Characterization
Serial Year
2001
Journal title
Materials Characterization
Record number
2265860
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