Title of article :
Influence of current density on microstructure of pulse electrodeposited tin coatings
Author/Authors :
Sharma، نويسنده , , Ashutosh and Bhattacharya، نويسنده , , Sumit and Sen، نويسنده , , Ranjan and Reddy، نويسنده , , B.S.B. and Fecht، نويسنده , , H.-J. and Das، نويسنده , , Karabi and Das، نويسنده , , Siddhartha، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
11
From page :
22
To page :
32
Abstract :
Pulse electrodeposited tin coatings on copper substrate have been synthesized from an aqueous solution containing sodium stannate (Na2SnO3.3H2O) and sodium hydroxide (NaOH). The effect of current density on surface morphology of the deposits has been investigated. As deposited coatings are characterized by X-ray diffraction, scanning electron microscopy, electron backscatter diffraction, and line profile analysis. The X-ray diffraction analysis shows that the deposits consist of tetragonal (β-Sn) structure with microcrystalline grains. The deposits plated at lower current density exhibit (110) texture which decreases with increasing current densities. The effects of current density on Cu–Sn diffusion and whisker growth of the electrodeposited tin coatings are also reported here.
Keywords :
Coatings , diffusion , Pulse electrodeposition , Current Density
Journal title :
Materials Characterization
Serial Year :
2012
Journal title :
Materials Characterization
Record number :
2268545
Link To Document :
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