Title of article :
Self-assembly of block copolymers in thin films
Author/Authors :
Matsen، نويسنده , , Mark W، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
8
From page :
40
To page :
47
Abstract :
Block copolymers are recognized for their tendency to form well-ordered periodic microstructures, often with exceptionally intricate geometries. This class of molecule now promises to provide important commercial applications in the form of thin films. There have been many recent advances in the effort to create confined films, control surface potentials, probe and manipulate morphology, explain equilibrium behaviour, and understand kinetics. Such advances will be crucial in the development of applications for block copolymer films such as surface coatings, porous membranes, waveguides, and nanoscale templates.
Journal title :
Current Opinion in Colloid and Interface Science
Serial Year :
1998
Journal title :
Current Opinion in Colloid and Interface Science
Record number :
2304568
Link To Document :
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