Near tip stress intensity factor for an edge-crack in a Pb(ZrxTi1−x)O3 thin film with 90° domain switching under a continuous laser irradiation

The near tip stress intensity factor KI tip for an edge-crack in a Pb(ZrxTi1−x)O3 thin film was investigated by superposition of the applied stress intensity factor KI app under a continuous laser irradiation and the shielding stress intensity factor ΔKI for 90° domain switching. Both KI app and ΔKI were solved by the weight function method, and switching toughening was analyzed based on the small scale domain switching theory. Results show that KI tip of the edge-crack in the thin film is significantly affected by the initial poling angle, and the edge-crack tip is toughened by the domain switching area with the increase of the initial poling angle. The methodology can predict the fracture toughening of Pb(ZrxTi1−x)O3 thin films quantitatively.