Title of article
Silicon isotope enrichment for low activation
Author/Authors
Noda، نويسنده , , Tetsuji and Suzuki، نويسنده , , Hiroshi and Araki، نويسنده , , Hiroshi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
7
From page
173
To page
179
Abstract
Silicon isotope separation from hexafluorodisilane (Si2F6) has been examined using a CO2 pulsed laser. Si2F6 containing certain isotopes was preferentially decomposed to SiF4 depending on the wavenumber (k) of the laser. 29Si and 30Si were concentrated in the SiF4 produced at k=945–955 cm−1, and in the residual Si2F6 at k=970–980 cm−1. The SiF4 containing 30Si of about 43.3% and 29Si at a maximum of 12.3% was continuously produced with a yield of 4.4% at k=951.203 cm−1 and 9.6% at 956.205 cm−1, respectively. The decomposition reaction of Si2F6 by the infrared laser irradiation could be explained as Si2F6(gas)+nhν→SiF4(gas)+SiF2(solid), calculated from a mass balance analysis of the experimental results. A 30Si concentration higher than 90% was estimated to be achievable by repeating the irradiation of the residual Si2F6 at around k=975 cm−1 and finally decomposing the Si2F6 to SiF4 at k=951.203 cm−1. SiC enriched with 29Si and 30Si was predicted to show an excellent low activation behavior in fusion neutron environments.
Journal title
Fusion Engineering and Design
Serial Year
1998
Journal title
Fusion Engineering and Design
Record number
2349943
Link To Document