Author/Authors :
Fujisawa، نويسنده , , A and Iguchi، نويسنده , , H and Lee، نويسنده , , S and Crowley، نويسنده , , T.P and Hamada، نويسنده , , Y and Hidekuma، نويسنده , , S and Kojima، نويسنده , , M and Kubo، نويسنده , , S and Idei، نويسنده , , H and Nishimura، نويسنده , , K and Okamura، نويسنده , , S and Matsuoka، نويسنده , , K، نويسنده ,
Abstract :
A 200 keV heavy ion beam probe system has been prepared to measure potential profiles in the compact helical system. Probing beam trajectory is successfully controlled by a secondary beam sweep system to keep the injection angle of the secondary beam constant during the radial scan. As a result, it was observed that the potential profile changes after the neutral beam heating is applied on electron cyclotron heated plasmas.
