• Title of article

    Oblique injection system for ECH and ECCD in Heliotron E

  • Author/Authors

    Manabe، نويسنده , , Y. and Nagasaki، نويسنده , , K. and Morioka، نويسنده , , H. and Sakamoto، نويسنده , , K. and Obiki، نويسنده , , T.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1999
  • Pages
    8
  • From page
    99
  • To page
    106
  • Abstract
    The oblique injection system of high power millimeter waves is designed and installed for plasma profile control and electron cyclotron current drive in the Heliotron E helical device. The previous 106.4 GHz electron cyclotron heating (ECH) perpendicular injection system has been modified by installing a movable mirror and a grating polarizer, which are required for toroidally oblique injection. Although the beam size at the resonant position is larger due to diffraction when scanning the beam direction, it is still smaller than the plasma radius so that we can experimentally investigate the dependence of plasma profiles on the toroidal injection angle. Low power and high power test results on the movable mirror and the polarizer have shown that the system works well as designed. The system has successfully been applied to the plasma experiment on Heliotron E. Plasma experimental results using this system are also shown.
  • Keywords
    Heliotron E , Oblique injection system , Electron cyclotron heating
  • Journal title
    Fusion Engineering and Design
  • Serial Year
    1999
  • Journal title
    Fusion Engineering and Design
  • Record number

    2365649