Development of tungsten coating for fusion applications

Recent developments in fusion have led to reconsider the use of high-Z material as Plasma Facing Component (PFC). Tungsten is presently a good candidate according to its high energy threshold for physical sputtering and its lack of sensitivity to chemical sputtering. We present here a new deposition process of Tungsten, based on Plasma Assisted Chemical Vapor Deposition (PACVD). This process has been used to deposit tungsten and rhenium on several substrates. The analyses of the coating properties have shown good adhesion on graphite, stainless-steel and copper. A study has been done to apply this process to cover the plasma facing components in Tore-Supra