Title of article
Radiation-induced defects in antiferroelectric thin films
Author/Authors
Bittner، نويسنده , , Roland and Humer، نويسنده , , K. and Weber، نويسنده , , H.W. and Kundzins، نويسنده , , K. and Sternberg، نويسنده , , A.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
833
To page
836
Abstract
Radiation effects on highly oriented antiferroelectric (AFE) PbZrO3 (PZ) films with a thickness of approximately 400 nm are investigated in view of their possible application as a temperature sensitive element in a new bolometer system for fusion devices like ITER. The films were prepared by pulsed laser deposition (PLD). The dielectric constant was measured in the frequency range from 1 to 250 kHz in a stepwise cooling mode (∼2 °C min−1) from 400 °C to room temperature before and after irradiation to a fast neutron fluence of 2×1022 m−2 (E>0.1 MeV). After irradiation, the films were annealed in several steps up to ∼400 °C to remove the radiation-induced defects. The results are discussed in terms of two kinds of radiation effects, i.e. structural defects (oxygen vacancies) and radiation-induced charges, trapped at defect structures. The measurements show significant differences to sol–gel PZ thin films, which is mainly explained by the high quality of the PLD films.
Keywords
Antiferroelectric PZ thin films , Alternative bolometer system , Radiation-induced defects
Journal title
Fusion Engineering and Design
Serial Year
2003
Journal title
Fusion Engineering and Design
Record number
2369392
Link To Document