Title of article :
Effect of Accumulative Roll Bonding (ARB) Process on the Electrochemical Behavior of Pure Copper in 0.01 M KOH Solution
Author/Authors :
Imantalab، Omid نويسنده Department of Materials Engineering, Bu-Ali Sina University, Hamedan 65178-38695, Iran Imantalab, Omid , Fattah-alhosseini، Arash نويسنده Faculty of Engineering, Bu-Ali Sina University, Hamedan 65178-38695, Iran Fattah-alhosseini, Arash
Issue Information :
دوماهنامه با شماره پیاپی 0 سال 2015
Pages :
10
From page :
210
To page :
219
Abstract :
In this work, effect of accumulative roll bonding (ARB) process on the electrochemical behavior of pure copper in 0.01 M KOH solution were studied. Corrosion current density measured from potentiodynamic polarization plots, the passive film and charge-transfer resistance estimated with electrochemical impedance spectroscopy (EIS) and finally defect density drawn from Mott–Schottky analysis. Potentiodynamic polarization curves revealed that the higher number of cycles for specimens proceeds with the ARB process rather than annealing yield to lower corrosion current density. EIS results showed that as the number of ARB cycles increases, both passive film and the charge-transfer resistance increases. Mott–Schottky analysis revealed that with increasing the number of ARB cycles, the acceptor density of the passive films decreased. All electrochemical measurements showed that increasing the number of ARB cycles offer better conditions for forming the passive films
Journal title :
Analytical and Bioanalytical Electrochemistry
Serial Year :
2015
Journal title :
Analytical and Bioanalytical Electrochemistry
Record number :
2384762
Link To Document :
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