Efect of chemical vapor deposition parameters on the diameter of multi‑walled carbon nanotubes

The multi-walled carbon nanotubes (MWCNTs) with controlled diameter distribution are useful in the fabrication of composite materials as reinforcement, due to their superior strength and toughness. Chemical vapor deposition (CVD) is a viable process to synthesize MWCNTs. In this investigation, an attempt has been made to study the efect of CVD process parameters (reaction temperature, fow rate of precursor gas, process time) on the mean diameter of MWCNTs. The MWCNTs of controlled diameter distribution was selectively grown on NiO catalyst supported by Al2O3 nano particles. The argon and acetylene were used as carrier and carbon precursor gas, respectively. The catalyst and carbon samples were characterized using feld emission scanning electron microscopy, high-resolution transmission electron microscopy, Raman spectroscopy and thermogravimetric/diferential thermal analysis. From this investigation, it is understood that the increase in reaction temperature and fow rate of precursor gas increased the mean diameter of MWCNTs but increase in process time decreased the diameter. The diameter distribution and quality of MWCNTs are strongly infuenced by the diameter of the catalyst particles.