Author/Authors :
Hojabri, Alireza Department of Physics - Karaj Branch, Islamic Azad University, Karaj , Hajakbari, Fatemeh Department of Physics - Karaj Branch, Islamic Azad University, Karaj , Ghodrat, Yalda Department of Physics - Karaj Branch, Islamic Azad University, Karaj
Abstract :
Molybdenum oxide (α-MoO)thin films were prepared on quartz and silicon substrates by thermal oxidation of Mo thin films deposited using DC magnetron sputtering method. The influence of thermal oxidation times ranging from 60-240 min on the structural and morphological properties of the preparedfilms was investigated using X-ray diffraction, Atomic force microscopy and Fourier transform infrared spectroscopy. The XRD results revealed that the as deposited film was amorphous while those formed at thermal oxidation times between 60-180 min exhibited polycrystalline orthorhombic molybdenum oxides. The presence of (0k0) reflections in XRD patterns indicated the layered structure of α-MoO. Also the surface morphology of the films isdependent on the thermal oxidation times. The FTIR spectrum confirmed the formation of MoO3 and the peak at 992.53 cm-1 implythelayered structure of α-MoO3.
Keywords :
Thermal oxidation , Thin film , MoO3 , layered structure , Structural Properties
