Title of article
The low temperature resistivity of thermally evaporated antiferromagnetic Mn100-X Rux thin films
Author/Authors
AMPONG, Francis Kofi Kwame Nkrumah University of Science and Technology - Department of Physics, GHANA , BOAKYE, Francis Kwame Nkrumah University of Science and Technology - Department of Physics, GHANA
From page
23
To page
29
Abstract
Electrical resistivity measurements on thermally evaporated Mn100-x Rux thin films (with x = 0.05 at.% Ru and x = 2.5 at.% Ru) have been carried out over the temperature range from 300 to 1.4 K. A behaviour typical of the bulk a-Mn has been observed on the film with x = 0.05 at.% Ru. The Néel point of this specimen is established at 90 pm 1 K which is typical of the bulk. This Néel point is raised to 100 pm 1 K with x = 2.5 at.% Ru in a-Mn. A relatively long range magnetic ordering was observed with x = 0.05 at.% Ru in a-Mn indicating that the concentration of Ru has an adverse effect on antiferromagnetism in a-Mn. The low temperature resistivity of the 2.50 at.% Ru in a-Mn can be explained in terms of Kondo scattering
Keywords
Resistivity , spin disorder scattering , kondo scattering
Journal title
Turkish Journal of Physics
Journal title
Turkish Journal of Physics
Record number
2528722
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