Author/Authors :
. Fanaei S, .T university of sistan and baluchestan, زاهدان, ايران , Zahed, .B university of sistan and baluchestan, زاهدان, ايران , Behzadmehr, .A university of sistan and baluchestan, زاهدان, ايران , Ateshi, .H university of sistan and baluchestan, زاهدان, ايران
Abstract :
Chemical Vapor Deposition (CVD) is one of the most popular methods for producing Carbon Nanotubes (CNTs). The growth rate of CNTs based on CVD technique is investigated by using a numerical model based on finite volume method. Inlet gas mixture, including xylene as carbon source and mixture of argon and hydrogen as carrier gas enters into a horizontal CVD reactor at atmospheric pressure. In this article the operating pressure variations are studied as the effective parameter on CNT growth rate and length uniformity.
Keywords :
Carbon Nanotube , Chemical Vapor Deposition , Operating Pressure ,
