Title of article
Acetohydroxamic acid adsorbed at copper surface: electrochemical, Raman and theoretical observations
Author/Authors
du, juan education ministry, shanghai normal university - department of chemistry, key lab of resource chemistry, Shanghai, China , ying, ye education ministry, shanghai normal university - department of chemistry, key lab of resource chemistry, Shanghai, China , guo, xiao-yu education ministry, shanghai normal university - department of chemistry, key lab of resource chemistry, Shanghai, China , li, chuan-chuan education ministry, shanghai normal university - department of chemistry, key lab of resource chemistry, Shanghai, China , wu, yiping education ministry, shanghai normal university - department of chemistry, key lab of resource chemistry, Shanghai, China , wen, ying education ministry, shanghai normal university - department of chemistry, key lab of resource chemistry, Shanghai, China , yang, hai-feng education ministry, shanghai normal university - department of chemistry, key lab of resource chemistry, Shanghai, China
From page
285
To page
296
Abstract
Corrosion inhibition effect of AHA film formed on the copper surface by self-assembled monolayers technique was estimated in 3 wt% NaCl solution by electrochemical impedance spectroscopy and polarization methods. Polarization data indicated that AHA was an anodic inhibitor. The maximum inhibition efficiency reached 93.5% in the case of assembly 3 h in 10 mM AHA solution. The adsorption of AHA on the copper surface fits Langmuir adsorption isotherm. Surface-enhanced Raman scattering together with quantum chemical studies demonstrated that N–O and C=O groups were attached to the copper surface, predicting the feasible adsorption centers and confirming the relationship between the molecular structures of AHA and its inhibition property.
Keywords
Acetohydroxamic acid , EIS , Polarization , SERS , Anodic inhibitor
Journal title
International Journal of Industrial Chemistry (IJIC)
Journal title
International Journal of Industrial Chemistry (IJIC)
Record number
2564920
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