• Title of article

    First-principles calculations of the structural and electronic properties of AIN, GaN, InN, AIGaN and InGaN

  • Author/Authors

    Beloufa, Abbes University of Sidi BelAbbes - Centre de Recherches (ex-CFTE) - Applied Materials Laboratory, Algeria , Bensaad, Zouaoui University of Sidi Bel Abbes - Centre de Recherches (ex-CFTE) - Applied Materials Laboratory, Algeria , Soudini, Bel-Abbes University of Sidi BelAbbes - Centre de Recherches (ex-CFTE) - Applied Materials Laboratory, Algeria , Sekkal, Nadir Ecole Normale Superieure de l Enseignement Technique - Departement de Physique-Chimi, Oran , Bensaad, Abdelallah University of Sidi Bel Abbes - Centre de Recherches (ex-CFTE) - Applied Materials Laboratory, Algeria , Abid, Hamza University of Sidi Bel Abbes - Centre de Recherches (ex-CFTE) - Applied Materials Laboratory, Algeria

  • From page
    11
  • To page
    22
  • Abstract
    First principles calculations are carried out for A1N, GaN, InN, AlGaN and InGaN in various crystal structures. The computational method used to investigate the structural and the electronic properties is the full potential linear muffin-tin orbital (FP-LMTO) augmented by a plane-wave basis (PLW). Exchange-correlation has been accounted for within LDA using the exchange-correlation potential calculated by Vosko et al. and Perdew et al. The latter parameterisation takes into consideration the generalized gradient approximation (GGA). The results of the calculated properties for the considered compounds in the zincblende and wurtzite phases are discussed and compared to the theoretical works as well as to the experimental data. We have also applied this computational method to AlGaN and InGaN alloys to check its transferability to predict the structural and electronic properties from those of their parent compounds.
  • Keywords
    Electrical Properties , structural Properties , Alloys , (In , Al , Ga) N , LMTO methods
  • Journal title
    International Journal of Nanoelectronics and Materials
  • Journal title
    International Journal of Nanoelectronics and Materials
  • Record number

    2582282