Author/Authors :
shivaee, h.a. sharif university of technology - institute for nanoscience and nanotechnology, ايران , shivaee, h.a. university of turin - department of chemistry, Italy , celegato, f. istituto nazionale di ricerca metrologica (inrim), Italy , tiberto, p. istituto nazionale di ricerca metrologica (inrim), Italy , castellero, a. university of turin - department of chemistry, Italy , baricco, m. university of turin - department of chemistry, Italy , madaah hosseini, h.r. sharif university of technology - department of materials science and engineering, ايران
Abstract :
Thin films of Fe73.iCuiNb3.iSii4.7B8.2 alloy with 200, 500, and 800 nm thicknesses have been deposited by RF sputtering. Their magnetic properties have been characterized using Alternating Gradient Field Magnetometer (AGFM) and Vibrating Sample Magnetometer (VSM). The effects of residual stresses investigated by nanoindentation experiments were conducted on the as-deposited samples. It is observed that the coercivity of as-deposited films is inversely proportional to the thickness in relation with the residual stress induced during sputtering.
Keywords :
Magnetic properties , Thin films , Ion sputtering , Residual stresses , Nanoindentation
