Author/Authors :
Takamiya، Ikuko نويسنده , , Tsukamoto، Shiro نويسنده , , Shimoda، Masahiko نويسنده , , Miyashita، Naoki نويسنده , , Arisawa، Mitsuhiro نويسنده , , Arakawa، Yasuhiko نويسنده , , Nishida، Atsushi نويسنده ,
Abstract :
A more reactive palladium catalyst than homogeneous Pd(PPh3)4 catalyst for the Heck reaction supported on a sulfur-terminated GaAs(001) plate was developed. Sulfur termination using (NH4)2Sx at 60 °C and Pd absorption in acetonitrile at 100 °C is essential for the preparation of an active and stable catalyst. The catalyst could be reused in this reaction up to ten times.
Keywords :
Application-production research , prediction , grinding , Surface finish , Power requirement , Genetic-fuzzy system
