Title of article :
Ultrathin Silica Films with a Nanoporous Monolayer
Author/Authors :
Tanaka، Shunsuke نويسنده , , Nishiyama، Norikazu نويسنده , , Hayashi، Yasushi نويسنده , , Egashira، Yasuyuki نويسنده , , Ueyama، Korekazu نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
Ultrathin silica films with a monolayer of uniform nanopores were fabricated on a silicon substrate by contacting triblock copolymer films with tetraethoxysilane vapor followed by calcination to remove the copolymer.
Keywords :
prediction , Power requirement , Surface finish , grinding , Application-production research , Genetic-fuzzy system
Journal title :
CHEMISTRY LETTERS
Journal title :
CHEMISTRY LETTERS
