Title of article :
Limit analysis for laser removal of micron contaminant colloidal silicon dioxide particles from the super-smooth optical glass substrate by pulse Nd:YAG laser
Author/Authors :
Meng-Hua Ye، نويسنده , , Xingkuan Shi، نويسنده , , Edmund Cheung and Weizheng Yuan، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Keywords :
Super-smooth substrate surface , Laser Cleaning , Nd:YAG laser , Micro-particle contamination
Journal title :
OPTICS & LASER TECHNOLOGY
Journal title :
OPTICS & LASER TECHNOLOGY