مرکز منطقه ای اطلاع رساني علوم و فناوري - A phase field model for failure in interconnect lines due to coupled diffusion mechanisms

Title of article :

A phase field model for failure in interconnect lines due to coupled diffusion mechanisms

Author/Authors :

Deepali N. Bhate، نويسنده , , Allan F. Bower ، نويسنده , , Ashish Kumar Varshney and Umesh Chandra Joshi ، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 2002

Pages :

From page :

2057

To page :

2083

Keywords :

A. Di&usion , A. Electromigration , B. Voids , C. Finite elements

Journal title :

Journal of the Mechanics and Physics of Solids

Serial Year :

2002

Journal title :

Journal of the Mechanics and Physics of Solids

Record number :

354555

Link To Document :