The use of a focused-ion-beam machine to prepare transmission electron microscopy samples of residual photoresist
Author/Authors :
A. De Veirman ، نويسنده , , L. Weaver، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
8
From page :
213
To page :
220
Keywords :
TRANSMISSION ELECTRON MICROSCOPY , Tripod polishing , Ion milling , photoresist , Energy dispersive analysis , Parallel electronenergy loss spectroscopy , Focused ion beam
